Tailor-made functionalization of silicon nitride surfaces

Ahmed Arafat; Karin Schroën; Louis C P M de Smet; Ernst J R Sudhölter; Han Zuilhof

doi:10.1021/ja0483746

Tailor-made functionalization of silicon nitride surfaces

J Am Chem Soc. 2004 Jul 21;126(28):8600-1. doi: 10.1021/ja0483746.

Authors

Ahmed Arafat¹, Karin Schroën, Louis C P M de Smet, Ernst J R Sudhölter, Han Zuilhof

Affiliation

¹ Laboratory of Organic Chemistry, Wageningen University, Dreijenplein 8, 6703 HB Wageningen, The Netherlands.

PMID: 15250682
DOI: 10.1021/ja0483746

Abstract

This communication presents the first functionalization of a hydrogen-terminated silicon-rich silicon nitride (Si3Nx) surface with a well-defined, covalently attached organic monolayer. Properties of the resulting monolayers are monitored by measurement of the static water contact angle, X-ray photoelectron spectroscopy (XPS), and infrared reflection absorption spectroscopy (IRRAS). Further functionalization was performed by reaction of Si3Nx with a trifluoroethanol ester alkene (CH2=CH-(CH2)8CO2CH2CF3) followed by basic hydrolysis to afford the corresponding carboxylic acid-terminated monolayer with hydrophilic properties. These results show that Si3Nx can be functionalized with a tailor-made organic monolayer, has highly tunable wetting properties, and displays significant potential for further functionalization.