Block copolymer-templated chemical nanopatterning on pyrolyzed photoresist carbon films

Chem Commun (Camb). 2012 Oct 9;48(78):9741-3. doi: 10.1039/c2cc35010f.

Abstract

Block copolymer nanolithography has been extended to the nanopatterning of organic functionalities on pyrolyzed photoresist carbon films (PPFs) via diazonium chemistry, using PS-b-P4VP as the template.

Publication types

  • Research Support, Non-U.S. Gov't

MeSH terms

  • Carbon / chemistry*
  • Diazonium Compounds / chemistry
  • Molecular Structure
  • Nanotechnology*
  • Polystyrenes / chemistry*
  • Polyvinyls / chemistry*
  • Pyridines / chemistry*
  • Surface Properties

Substances

  • Diazonium Compounds
  • Polystyrenes
  • Polyvinyls
  • Pyridines
  • polystyrene-block-poly(4-vinylpyridine)
  • pyrolytic carbon
  • Carbon