Quantitative molecular plating of large-area 242Pu targets with improved layer properties

A Vascon; J Runke; N Trautmann; B Cremer; K Eberhardt; Ch E Düllmann

doi:10.1016/j.apradiso.2014.10.002

Quantitative molecular plating of large-area ²⁴²Pu targets with improved layer properties

Appl Radiat Isot. 2015 Jan:95:36-43. doi: 10.1016/j.apradiso.2014.10.002. Epub 2014 Oct 12.

Authors

A Vascon¹, J Runke², N Trautmann³, B Cremer⁴, K Eberhardt⁵, Ch E Düllmann⁶

Affiliations

¹ Institute of Nuclear Chemistry, Johannes Gutenberg University Mainz, 55099 Mainz, Germany; Helmholtz-Zentrum Dresden-Rossendorf, 01328 Dresden, Germany. Electronic address: vascon.alessio@jaea.go.jp.
² SHE Chemistry Department, GSI Helmholtzzentrum für Schwerionenforschung GmbH, 64291 Darmstadt, Germany.
³ Institute of Nuclear Chemistry, Johannes Gutenberg University Mainz, 55099 Mainz, Germany.
⁴ European Commission, Joint Research Centre, Institute for Transuranium Elements, P.O. Box 2340, 76125 Karlsruhe, Germany.
⁵ Institute of Nuclear Chemistry, Johannes Gutenberg University Mainz, 55099 Mainz, Germany; SHE Chemistry Research Section, Helmholtz Institute Mainz, 55099 Mainz, Germany.
⁶ Institute of Nuclear Chemistry, Johannes Gutenberg University Mainz, 55099 Mainz, Germany; SHE Chemistry Department, GSI Helmholtzzentrum für Schwerionenforschung GmbH, 64291 Darmstadt, Germany; SHE Chemistry Research Section, Helmholtz Institute Mainz, 55099 Mainz, Germany.

PMID: 25464174
DOI: 10.1016/j.apradiso.2014.10.002

Abstract

For measurements of the neutron-induced fission cross section of ²⁴²Pu, large-area (42cm²) ²⁴²Pu targets were prepared on Ti-coated Si wafers by means of constant current density molecular plating. Radiochemical separations were performed prior to the platings. Quantitative deposition yields (>95%) were determined for all targets by means of alpha-particle spectroscopy. Layer densities in the range of 100-150μg/cm² were obtained. The homogeneity of the targets was studied by radiographic imaging. A comparative study between the quality of the layers produced on the Ti-coated Si wafers and the quality of layers grown on normal Ti foils was carried out by applying scanning electron microscopy and energy dispersive X-ray spectroscopy. Ti-coated Si wafers resulted clearly superior to Ti foils in the production of homogeneous ²⁴²Pu layers with minimum defectivity.

Keywords: (242)Pu; Improved layer properties; Large-area targets; Molecular plating; Quantitative deposition yield; Scanning electron microscopy–energy dispersive X-ray spectroscopy (SEM–EDX).