UV absorbers are very effective in the fields of antiyellowing, resistance of photocatalytic degradation, and sunscreen cosmetics. However, commercialized UV absorbers have the drawbacks of toxicity, low absorption efficiency, transparency, etc. Here, we report for the first time silicon quantum dots as full-band UV absorbers. The NH-refunctionalized silicon quantum dots with high-performance UV absorption were successfully synthesized under the synergistic effect of sodium citrate and ethanediamine, and the (NH, OH)-functionalized silicon quantum dots (SiQDs) with full-band UV absorption can be achieved by reregulating -NH2 and -OH groups on the surface. The as-prepared (NH, OH)-functionalized SiQDs exhibited good stability and underwent treatment of varying pH and temperature. Furthermore, experimental results demonstrated that compared to commercial water-soluble organic UV absorbers, the (NH, OH)-functionalized SiQDs showed better antiyellowing performance for polyurethane and resistance of photocatalytic degradation for rhodamine B, and presented huge application potential in sunscreen cosmetics. Finally, the UV absorption mechanism of SiQDs was explained to be mainly related to Γ → Γ direct band gap transition, which absorb UV light and release it as thermal radiation.
Keywords: antiyellowing; resistance of photodegradation; silicon quantum dots; sunscreen; ultraviolet absorption.