Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

Affiliations

• ¹ Center for High Technology Materials, University of New Mexico, Albuquerque, NM, 87106, USA.
• ² Department of Mechanical Engineering, University of New Mexico, Albuquerque, NM, 87131, USA.
• ³ Nanoscience and Microsystems Engineering, University of New Mexico, Albuquerque, NM, 87131, USA.
• ⁴ Center for High Technology Materials, University of New Mexico, Albuquerque, NM, 87106, USA. skrishna@chtm.unm.edu.