Intel's efforts to build a practical quantum computer are focused on developing a scalable spin-qubit platform leveraging industrial high-volume semiconductor manufacturing expertise and 300 mm fabrication infrastructure. Here, we provide an overview of the design, fabrication, and demonstration of a new customized quantum test chip, which contains 12-quantum-dot spin-qubit linear arrays, code named Tunnel Falls. These devices are fabricated using immersion and extreme ultraviolet lithography (EUV), along with other standard high-volume manufacturing (HVM) processes as well as production-level process control. We present key device features and fabrication details as well as qubit characterization results confirming device functionality. These results corroborate our fabrication methods and are a crucial step toward scaling of extensible 2D qubit array schemes.
Keywords: industrial; manufacturing; quantum dots; qubits; silicon; silicon germanium.