Hematite is a promising material for photoelectrochemical (PEC) water oxidation, but its photocurrent is limited by bulk charge recombination and poor oxidation kinetics. In this study, we report a high-performance Fe2O3 photoanode achieved through gradient surface gallium doping, utilizing a Ga2O3 overlayer on FeOOH precursors via atomic layer deposition (ALD) and co-annealing for Ga diffusion. The Ga-doped layer passivates surface states and modifies the band structure, creating a built-in electric field that enhances the charge separation efficiency. Following the electrodeposition of CoFeOx as a cocatalyst, the resulting CoFe-Ga:Fe2O3 photoanode exhibited a notable negative shift in onset potential by approximately 100 mV, a high photocurrent density of 2.6 mA cm-2 at 1.23 V versus RHE, and excellent long-term PEC stability over 40 h. This work presents an effective strategy for enhancing the PEC performance of photoelectrodes through advanced surface coatings.
Keywords: Fe2O3 photoanode; atomic layer deposition; gradient doping; photoelectrochemical water oxidation.