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Intrinsic p type ZnO films deposited by rf magnetron sputtering.
Wang J, Martins R, Barradas NP, Alves E, Monteiro T, Peres M, Elamurugu E, Fortunato E. Wang J, et al. Among authors: elamurugu e. J Nanosci Nanotechnol. 2009 Feb;9(2):813-6. doi: 10.1166/jnn.2009.c030. J Nanosci Nanotechnol. 2009. PMID: 19441398