Vos MFJ - Search Results

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Atomic Layer Deposition of Cobalt Using H₂-, N₂-, and NH₃-Based Plasmas: On the Role of the Co-reactant.

Vos MFJ, van Straaten G, Kessels WMME, Mackus AJM. Vos MFJ, et al. J Phys Chem C Nanomater Interfaces. 2018 Oct 4;122(39):22519-22529. doi: 10.1021/acs.jpcc.8b06342. Epub 2018 Sep 5. J Phys Chem C Nanomater Interfaces. 2018. PMID: 30319724 Free PMC article.

Reaction Mechanisms during Atomic Layer Deposition of AlF₃ Using Al(CH₃)₃ and SF₆ Plasma.

Vos MFJ, Knoops HCM, Kessels WMM, Mackus AJM. Vos MFJ, et al. J Phys Chem C Nanomater Interfaces. 2021 Feb 25;125(7):3913-3923. doi: 10.1021/acs.jpcc.0c10695. Epub 2021 Feb 10. J Phys Chem C Nanomater Interfaces. 2021. PMID: 33815650 Free PMC article.

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