A novel route for the inclusion of metal dopants in silicon.
Gardener JA, Liaw I, Aeppli G, Boyd IW, Chater RJ, Jones TS, McPhail DS, Sankar G, Stoneham AM, Sikora M, Thornton G, Heutz S.
Gardener JA, et al. Among authors: boyd iw.
Nanotechnology. 2010 Jan 15;21(2):025304. doi: 10.1088/0957-4484/21/2/025304. Epub 2009 Dec 3.
Nanotechnology. 2010.
PMID: 19955611