Reduced Contact Resistance Between Metal and n-Ge by Insertion of ZnO with Argon Plasma Treatment.
Zhang Y, Han G, Wu H, Wang X, Liu Y, Zhang J, Liu H, Zheng H, Chen X, Liu C, Hao Y.
Zhang Y, et al. Among authors: liu y, liu h, liu c.
Nanoscale Res Lett. 2018 Aug 15;13(1):237. doi: 10.1186/s11671-018-2650-y.
Nanoscale Res Lett. 2018.
PMID: 30112730
Free PMC article.