Ultrathin ferroic HfO2-ZrO2 superlattice gate stack for advanced transistors.
Cheema SS, Shanker N, Wang LC, Hsu CH, Hsu SL, Liao YH, San Jose M, Gomez J, Chakraborty W, Li W, Bae JH, Volkman SK, Kwon D, Rho Y, Pinelli G, Rastogi R, Pipitone D, Stull C, Cook M, Tyrrell B, Stoica VA, Zhang Z, Freeland JW, Tassone CJ, Mehta A, Saheli G, Thompson D, Suh DI, Koo WT, Nam KJ, Jung DJ, Song WB, Lin CH, Nam S, Heo J, Parihar N, Grigoropoulos CP, Shafer P, Fay P, Ramesh R, Mahapatra S, Ciston J, Datta S, Mohamed M, Hu C, Salahuddin S.
Cheema SS, et al.
Nature. 2022 Apr;604(7904):65-71. doi: 10.1038/s41586-022-04425-6. Epub 2022 Apr 6.
Nature. 2022.
PMID: 35388197