Zhang C - Search Results

1

Effects of Substrate Temperature on Optical, Structural, and Surface Properties of Metal-Organic Vapor Phase Epitaxy-Grown MgZnO Films.

Liu J, Xie D, Feng ZC, Nafisa MT, Wan L, Qiu ZR, Wuu DS, Zhang C, Yiin J, Lin HH, Lu W, Klein B, Ferguson IT, Liu S. Liu J, et al. Among authors: zhang c. Nanomaterials (Basel). 2024 Dec 5;14(23):1957. doi: 10.3390/nano14231957. Nanomaterials (Basel). 2024. PMID: 39683345 Free PMC article.

2

Optical, Structural, and Synchrotron X-ray Absorption Studies for GaN Thin Films Grown on Si by Molecular Beam Epitaxy.

Feng ZC, Liu J, Xie D, Nafisa MT, Zhang C, Wan L, Jiang B, Lin HH, Qiu ZR, Lu W, Klein B, Ferguson IT, Liu S. Feng ZC, et al. Among authors: zhang c. Materials (Basel). 2024 Jun 14;17(12):2921. doi: 10.3390/ma17122921. Materials (Basel). 2024. PMID: 38930290 Free PMC article.

3

Fitting-determined formulation of effective medium approximation for 3D trench structures in model-based infrared reflectrometry.

Zhang C, Liu S, Shi T, Tang Z. Zhang C, et al. J Opt Soc Am A Opt Image Sci Vis. 2011 Feb 1;28(2):263-71. doi: 10.1364/JOSAA.28.000263. J Opt Soc Am A Opt Image Sci Vis. 2011. PMID: 21293531

4

Improved model-based infrared reflectrometry for measuring deep trench structures.

Zhang C, Liu S, Shi T, Tang Z. Zhang C, et al. J Opt Soc Am A Opt Image Sci Vis. 2009 Nov;26(11):2327-35. doi: 10.1364/JOSAA.26.002327. J Opt Soc Am A Opt Image Sci Vis. 2009. PMID: 19884928

5

[Model-based FTIR reflectometry measurement system for deep trench structures of DRAM].

Liu SY, Zhang CW, Shen HW, Gu HY. Liu SY, et al. Guang Pu Xue Yu Guang Pu Fen Xi. 2009 Apr;29(4):935-9. Guang Pu Xue Yu Guang Pu Fen Xi. 2009. PMID: 19626876 Chinese.

6

Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology.

Chen X, Du W, Yuan K, Chen J, Jiang H, Zhang C, Liu S. Chen X, et al. Among authors: zhang c. Rev Sci Instrum. 2016 May;87(5):053707. doi: 10.1063/1.4952385. Rev Sci Instrum. 2016. PMID: 27250435

7

Improved measurement accuracy in optical scatterometry using correction-based library search.

Chen X, Liu S, Zhang C, Jiang H. Chen X, et al. Among authors: zhang c. Appl Opt. 2013 Sep 20;52(27):6726-34. doi: 10.1364/AO.52.006726. Appl Opt. 2013. PMID: 24085171

8

Calibration of misalignment errors in composite waveplates using Mueller matrix ellipsometry.

Gu H, Liu S, Chen X, Zhang C. Gu H, et al. Among authors: zhang c. Appl Opt. 2015 Feb 1;54(4):684-93. doi: 10.1364/AO.54.000684. Appl Opt. 2015. PMID: 25967775

9

Robust solution to the inverse problem in optical scatterometry.

Zhu J, Liu S, Chen X, Zhang C, Jiang H. Zhu J, et al. Among authors: zhang c. Opt Express. 2014 Sep 8;22(18):22031-42. doi: 10.1364/OE.22.022031. Opt Express. 2014. PMID: 25321577 Free article.

10

Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry.

Zhu J, Liu S, Jiang H, Zhang C, Chen X. Zhu J, et al. Among authors: zhang c. Opt Lett. 2015 Feb 15;40(4):471-4. doi: 10.1364/OL.40.000471. Opt Lett. 2015. PMID: 25680127

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